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Characterisation of Excimer Laser Crystallised Polysilicon by X-Ray Diffraction and by Channeling Contrast in a Scanning Electron Microscope

机译:X射线衍射X射线衍射的准分子激光结晶多晶硅的表征及扫描电子显微镜中的对比度

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Structural characterization of polycrystalline silicon is usually performed by SEM technique on SECCO-etched samples. In this work we analyse, for the first time, Excimer Laser Annealed (ELA)-polysilicon by using channelling contrast effect produced when SEM is operating with low beam energy and high current density. This technique allows grain size study without chemical etching. In addition X-Ray Diffraction (XRD) analysis was performed to determined the crystallographic orientation and size of the crystallites.
机译:多晶硅的结构表征通常通过SEM技术在SECCO蚀刻样品上进行。在这项工作中,我们通过使用SEM以低光束能量和高电流密度运行时,首次分析准分子激光退火(ELA)-Polysilicon。这种技术允许无需化学蚀刻的粒度研究。此外,进行X射线衍射(XRD)分析以确定微晶的晶体取向和尺寸。

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