首页> 外文会议>Symposia on III-V nitride materials and processes >Single crystal GaN substrate grown by hydride-metal organic vapor phase epitaxy (H-Movpe)
【24h】

Single crystal GaN substrate grown by hydride-metal organic vapor phase epitaxy (H-Movpe)

机译:由氢化物 - 金属有机气相外延(H-MOVPE)生长单晶GaN衬底

获取原文

摘要

We report on successful growth of single-crystal GaN substrates by combining the LiGaO_2 substrates. The key to obtaining high quality GaN films on LiGaO_2 was the initial surface nitridation step. A self-separating technique was developed that leaves free-standing flat single crystal GaN without mechanical or chemical treatment. It was determined that surface nitridation and cooling process are critical in film-substrate self-separation.
机译:通过组合Ligao_2基材来报告单晶GaN基材的成功增长。获得高质量GaN薄膜的Ligao_2的关键是初始表面氮化步骤。开发了一种自分分技术,留下没有机械或化学处理的独立式平坦单晶GaN。确定表面氮化和冷却过程在薄膜基质自分离中是至关重要的。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号