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Analysis of heat and mass transfer during multi-wafer low pressure chemical vapor deposition process

机译：多晶片低压化学气相沉积工艺中的热和传质分析

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An analysis of heat and mass transfer has been carried out for multi-wafer Low Pressure Chemical Vapor Deposition (LPCVD).

机译：已经对多晶片低压化学气相沉积（LPCVD）进行了热量和传质。

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《International heat transfer conference》|1998年||共6页
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K.S. Park; M. Choi;
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4. Analysis of heat and mass transfer during multi-wafer low pressure chemical vapor deposition process [C] . K.S. Park, M. Choi International heat transfer conference;IHTC1998 . 1998

机译：多晶片低压化学气相沉积过程中的传热传质分析
5. Design, operation, and heat and mass transfer analysis of a gas-jet laser chemical vapor deposition system. [D] . Duty, Chad Edward. 2001

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Analysis of heat and mass transfer during multi-wafer low pressure chemical vapor deposition process

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