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SEGREGATION GETTERING BY IMPLANTATION-FORMED CAVITIES AND B-Si PRECIPITATES IN SILICON

机译:通过植入形成的空腔和B-Si沉淀物在硅中偏析

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We show that Fe, Co, Cu, and Au in Si undergo strong segregation gettering to cavities and B-Si precipitates formed by He or B ion implantation and annealing. The respective mechanisms are argued to be chemisorption on the cavity walls and occupation of solution sites within the disordered, B-rich, B-Si phase. The strengths of the reactions are evaluated, enabling prediction of gettering performance.
机译:我们展示了Si中的Fe,Co,Cu和Au经历了强烈的偏析,以通过他或B离子注入和退火形成的空腔和B-Si沉淀物。各种机制被认为是在腔壁壁上的化学吸取和占用无序的B-富含B-Si相中的溶液位点。评估反应的优点,从而能够预测吸收性的性能。

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