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Electroless plating of nickel-tungsten-phosphorus alloy for hybrid circuit packaging

机译:用于混合电路封装的镍钨磷合金的化学镀

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The electroless plating process of nickel-tungsten-jphosphorus (Ni-W-P) alloy applied in thin film resistor making is described in the paper. Some factors, such as the bath composition, operating conditions(e.g., temperature, plating time and pH value), especially the effects of additives on the Ni-W-P thin film resistor are also discussed. It has been proved that adding a small amount of earth elements to the bath not only increased corrosion resistance of the deposit, but also improved the stability of thin film resistor. The results of heat-treatment and aging test showed that the atmosphere has obvious influences on the thin film resistor; after annealing in elevated temperature (above 250 deg C) in the air, the resistance increases rapidly, which mainly attributed to the oxidation of Ni-W-P film; and after annealing in 400 deg C under technical pure N_2 or H_2 atmosphere for 15 mins, there are no obvious changes for the resistance. The data of the aging test in 150 deg C in the air demonstrated the good resistance stability of the Ni-W-P film.
机译:纸张中描述了在薄膜电阻器制造中施加的镍钨-jphosphorus(Ni-W-P)合金的化学镀方法。还讨论了一些因素,例如浴组合物,操作条件(例如,温度,镀层时间和pH值),尤其讨论了添加剂对Ni-W-P薄膜电阻器的影响。已经证明,将少量的地球元素添加到浴缸中不仅增加了沉积物的耐腐蚀性,而且还提高了薄膜电阻的稳定性。热处理和老化试验结果表明,大气对薄膜电阻有明显的影响;在空气中在升高的温度(250℃)中退火后,电阻迅速增加,这主要归因于Ni-W-P膜的氧化;在400℃的技术纯N_2或H_2大气下退火15分钟后,阻力没有明显的变化。在空气中150℃的老化试验的数据显示了Ni-W-P膜的良好阻力稳定性。

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