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Dislocation luminescence and electrical properties of dislocation network produced by silicon direct wafer bonding

机译:硅直接晶圆键合产生的位错管道的脱位发光和电气性能

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Cathodoluminescent (CL) and electrical properties of the dislocation network (DN) produced by direct silicon wafer bonding were investigated. A strong impact of the electric field on the spectrum shape and the intensity of dislocation related CL of the DN built into space charge region (SCR) of Schottky-diode was found. Correlations between the characteristic features of the dependences of CL, dark current, electron beam induced current (EBIC) and capacitance on the applied bias were established. The energy diagram explaining obtained results is proposed.
机译:研究了通过直接硅晶片键合产生的位错(DN)的阴极发光(CL)和电特性。找到了电场对肖特基 - 二极管的空间电荷区域(SCR)的光谱形状对光谱形状和位错相关CL的强度的强烈影响。建立了CL,暗电流,电子束感应电流(EBIC)的依赖性的特征与所施加的偏差上的电容之间的相关性。提出了解释结果的能量图。

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