Hexamethyldisiloxane-oxygen and hexamethyldisilazane-oxygen mixtures belongs to the category of siloxane feeds which are widely utilized for plasma enhanced chemical vapor deposition of thin films of important materials such as SiO2-likes, silicone-likes, and Si-films with high monomer structure retention. Thin film deposition from organosilanes will be discussed; it will be shown that film stoichiometry can be continuously changed from that of the monomer to that of SiC>2 material, by ranging the oxygen-to-monomer ratio in the feed from 0 to 20.
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