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Highly textured surface ZnO:B-TCO films for solar cells deposited with gradual doping growth technique

机译:高度纹理表面ZnO:用于沉积逐渐掺杂生长技术的太阳能电池B-TCO薄膜

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Through combining adjusting film thickness and gradual boron doping growth,highly natively textured surface boron doped zinc oxide (ZnO:B) transparent conducting oxide (TCO) films have been fabricated by using metal organic chemical vapor deposition (MOCVD).Experimental results indicate that thicker films present much larger grain sizes and remarkable higher haze values,whose grains have reached ~600 nm.Typical haze values of ZnO:B films are 68.7% at 500 nm wavelength and 27% at 850 nm wavelength,respectively.These highly textured surface ZnO:B films are promising TCO layers applied as substrates for wide-spectrum silicon-based thin film solar cells.
机译:通过组合调节膜厚度和逐渐硼掺杂生长,通过使用金属有机化学气相沉积(MOCVD)制造了高度本质纹理的表面硼掺杂的氧化锌(ZnO:B)透明导电(TCO)膜。实验结果表明较厚薄膜存在大量较大的粒度和显着的更高的雾度值,其晶粒已达到〜600nm. ZnO:B膜的典型雾度值分别为500nm波长为500nm波长为68.7%,分别为850nm波长为27%。这些高度纹理的表面ZnO :B薄膜是有前途的TCO层作为基于宽谱硅基薄膜太阳能电池的基板。

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