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X-ray topographic studies of α-SiC single crystalline ingots grown by the sublimation method

机译:升华法生长α-SiC单晶锭的X射线地形研究

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Characterization of single crystalline SiC grown in the [0001] and the [1100] directions by the modified-Lely method has been carried out by x-ray topography. Wafers parallel and perpendicular to the growth direction cut from the grown ingots were examined by transmission topographs of the Lang method. The crystals grown in the [0001] and the [1100] directions showed a large difference in both types and densities of crystal defects. We discuss the relationship between the crystal growth direction and the defect formation in the sublimation growth oi SiC crystals.
机译:通过X射线形貌进行了通过改性李的单晶SiC生长的单晶SiC和[1100]方向。通过朗法的透射拓扑检查从生长的锭切割的平行和垂直于生长方向的晶片。在[0001]和[1100]方向上生长的晶体显示出晶体缺陷的两种类型和密度的较大差异。我们讨论了晶体生长方向与升华生长型晶体中的缺陷形成之间的关系。

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