Characterization of single crystalline SiC grown in the [0001] and the [1100] directions by the modified-Lely method has been carried out by x-ray topography. Wafers parallel and perpendicular to the growth direction cut from the grown ingots were examined by transmission topographs of the Lang method. The crystals grown in the [0001] and the [1100] directions showed a large difference in both types and densities of crystal defects. We discuss the relationship between the crystal growth direction and the defect formation in the sublimation growth oi SiC crystals.
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