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Investigation of structural perfection of SiC ingots grown by a sublimation method

机译:升华法生长SiC晶锭的结构完善性研究

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摘要

Monocrystalline SiC ingots were grown by a modified Lely method using 6H-SiC seed crystals with (0001) base plane. The crystal growth was carried out in the temperature range 2200-2500 ⁰C at Ar pressure from 2 to 40 mbar. The rate of growth varied between 0.3 and 1.5 mm/hour in the C-axis direction. At growth time of about 15 hours we obtained the ingots with 35 mm useful diameter. To determine the polytype composition of SiC ingots the Raman scattering technique was used. The structural defects were investigated by means of reflection and transmission light microscopy and by selective etching. In the best ingots the dislocation density did not exceed 102 cm⁻², the micropipe density - 10-20 cm⁻², and blocks were absent.
机译:使用具有(0001)基面的6H-SiC籽晶,通过改进的Lely方法生长单晶SiC铸锭。晶体生长是在2200至2500⁰C的温度范围,2至40 mbar的Ar压力下进行的。生长速度在C轴方向上介于0.3到1.5毫米/小时之间。在约15小时的生长时间,我们获得了有效直径35毫米的铸锭。为了确定SiC锭的多型组成,使用了拉曼散射技术。通过反射和透射光学显微镜以及通过选择性蚀刻来研究结构缺陷。在最好的铸锭中,位错密度不超过102 cm-2,微管密度-10-20 cm-2,并且没有块。

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