Electron-beam-pulse induced time-domain depolarization in plasma deposited hydrogenated carbon-silicon films

机译：等离子体沉积氢化碳 - 硅膜中的电子束脉冲诱导的时域去极化

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In this paper an interesting extension of the VPITDD in the domain of shorter polarization times is presented. The results for plasma deposited carbon-silicon films are discussed in details.

机译：在本文中，介绍了较短偏振时间域中VPITDD的有趣扩展。细节讨论了等离子体沉积的碳 - 硅膜的结果。

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《IEEE International Conference on Conduction and Breakdown in Solid Dielectrics》|1995年||共5页
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Kazimierski P.; Tyczkowski J.; Institute of Electric and Electronic Engineer;
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中图分类自动化技术、计算机技术;
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机译：等离子体沉积的无定形氢化碳膜及其摩擦学性能

Electron-beam-pulse induced time-domain depolarization in plasma deposited hydrogenated carbon-silicon films

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