Effects of absorptive dye loading and substrate reflectivity on a 0.5-micron i-line photoresists process

摘要

The effects of an increasing amount of absorptive dye contained in a positive i-line photoresist were studied for a 0.5 $mu@m process on two substrates with substantially different reflectivities. Parameters such as dissolution rates, focus latitudes, and resistance to reflective notching were simulated and compared to experimental results. Reductions in resist profile and focus latitude were observed as the photoresist non- bleachable absorbance was increased, and as the substrate reflectivity was decreased. It was also found that a reduction in substrate reflectivity was more effective than increasing the resist dye loading in suppressing reflective notching of the photoresist.