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A comparison of some ferroelectric and piezoelectric films for SAW devices on silicon

机译:硅锯装置的一些铁电和压电薄膜的比较

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A comparative study of a few ferroelectric and piezoelectric films for surface acoustic wave devices on a Si substrate is reported. Theoretical dispersion curves of phase velocity and coupling coefficient as a function of normalized thickness have been calculated for a film-Si structure with an interdigital transducer at the top of film. The material parameters for bulk crystals/ceramics have been used for calculation of the phase velocity and coupling coefficient. To make use of the large coupling coefficients of ferroelectric films on Si, comparatively thick films are required. The material parameters in the thin films are different from the bulk materials. The problem in estimating these constants for films is considered by comparing the theoretical and experimentally reported SAW data of ZnO films.
机译:报道了Si衬底上几个铁电和压电膜的比较研究。已经计算了作为归一化厚度的函数的相速度和耦合系数的理论色散曲线,用于膜上的薄膜-Si结构,在薄膜顶部的瞬间换能器。用于散装晶体/陶瓷的材料参数已用于计算相速度和耦合系数。为了利用Si上的Si上的铁电薄膜的大耦合系数,需要相对厚的薄膜。薄膜中的材料参数与散装材料不同。通过比较ZnO膜的理论和实验报道的锯数据,考虑估计这些薄膜常数的问题。

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