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A comparison of some ferroelectric and piezoelectric films for SAW devices on silicon

机译:硅表面声波器件中某些铁电和压电薄膜的比较

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A comparative study of a few ferroelectric and piezoelectric films for surface acoustic wave devices on a Si substrate is reported. Theoretical dispersion curves of phase velocity and coupling coefficient as a function of normalized thickness have been calculated for a film-Si structure with an interdigital transducer at the top of film. The material parameters for bulk crystals/ceramics have been used for calculation of the phase velocity and coupling coefficient. To make use of the large coupling coefficients of ferroelectric films on Si, comparatively thick films are required. The material parameters in the thin films are different from the bulk materials. The problem in estimating these constants for films is considered by comparing the theoretical and experimentally reported SAW data of ZnO films.
机译:报道了在硅衬底上用于声表面波器件的几种铁电和压电薄膜的比较研究。对于在膜顶部具有叉指式换能器的膜-Si结构,已计算出相速度和耦合系数与归一化厚度的函数关系的理论色散曲线。大块晶体/陶瓷的材料参数已用于计算相速度和耦合系数。为了利用Si上的铁电膜的大耦合系数,需要相对厚的膜。薄膜中的材料参数不同于块状材料。通过比较ZnO薄膜的理论和实验报道的SAW数据,可以考虑估算薄膜中这些常数的问题。

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