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Theoretical investigation of acoustic wave devices based on different piezoelectric films deposited on silicon carbide

机译:基于沉积在碳化硅上的不同压电膜的声波器件的理论研究

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摘要

Performances of acoustic wave (AW) devices based on silicon carbide (SiC) substrates are theoretically studied, in which two types of piezoelectric films of ZnO and A1N deposited on 4H-SiC and 3C-SiC substrates are adopted. The phase velocities (PV), electromechanical coupling coefficients (ECC), and temperature coefficients of frequency (TCF) for three AW modes (Rayleigh wave, A_0 and S_0 modes of Lamb wave) often used in AW devices are calculated based on four types of configurations of interdigital transducers (IDTs). It is found that that the ZnO piezoelectric film is proper for the AW device operating in the low-frequency range because a high ECC can be realized using a thin ZnO film. The A1N piezoelectric film is proper for the device operating in the high-frequency range in virtue of the high PV of A1N, which can increase the finger width of the IDT. Generally, in the low-frequency Lamb wave devices using ZnO piezoelectric films with small normalized thicknesses of films to wavelengths h_f/λ, thin SiC substrates can increase ECCs but induce high TCFs simultaneously. In the high-frequency device with a large h_f/λ, the S_0 mode of Lamb wave based on the A1N piezoelectric film deposited on a thick SiC substrate exhibits high performances by simultaneously considering the PV, ECC, and TCF.
机译:从理论上研究了基于碳化硅(SiC)衬底的声波(AW)器件的性能,其中采用了沉积在4H-SiC和3C-SiC衬底上的两种类型的ZnO和AlN压电膜。根据四种类型的AW计算AW器件中常用的三种AW模式(瑞利波,兰姆波的A_0和S_0模式)的相速度(PV),机电耦合系数(ECC)和频率温度系数(TCF)。叉指换能器(IDT)的配置。发现ZnO压电膜适合于在低频范围内工作的AW器件,因为可以使用薄的ZnO膜实现高ECC。由于AlN的PV高,AlN压电膜适合在高频范围内工作的设备,这会增加IDT的指宽。通常,在使用波长为h_f /λ的归一化厚度小的ZnO压电薄膜的低频Lamb波器件中,薄SiC衬底可以增加ECC,但同时会引起高TCF。在具有高h_f /λ的高频器件中,通过同时考虑PV,ECC和TCF,基于沉积在厚SiC衬底上的AlN压电膜的兰姆波的S_0模式呈现出高性能。

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  • 来源
    《Journal of Applied Physics》 |2013年第2期|024504.1-024504.7|共7页
  • 作者单位

    Laboratory of Modern Acoustics, Institute of Acoustics, Nanjing University, Nanjing 210093, People's Republic of China;

    Laboratory of Modern Acoustics, Institute of Acoustics, Nanjing University, Nanjing 210093, People's Republic of China;

    Laboratory of Modern Acoustics, Institute of Acoustics, Nanjing University, Nanjing 210093, People's Republic of China;

    Laboratory of Modern Acoustics, Institute of Acoustics, Nanjing University, Nanjing 210093, People's Republic of China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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