Metrology issues associated with submicron linewidths

摘要

The three conventional techniques - optical, low voltage scanning electron microscopy (LVSEM), and electrical linewidth measurement - continue to be employed, but each technique has unique applications, problems, and limitations. In this paper these techniques are investigated for submicron linewidth metrology. A great deal of emphasis is placed on the calibration of these tools and the potential for problems associated with the tools.