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Annual SPIE conference on Integrated circuit metrology, inspection, and process control

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1.Half-micrometer linewidth metrology

机译：半千分尺线宽计量
- 作者：Stephen E. Knight;Dean Humphrey;Reginald R. Bowley;Robert M. Cogley
- 会议名称：《Annual SPIE conference on Integrated circuit metrology, inspection, and process control》 | 1991年
2.New phase-shifting mask structure for positive resist process

机译：用于正抗蚀剂过程的新型移位面罩结构
- 作者：Junji Miyazaki;Kazuya Kamon;Nobuyuki Yoshioka;Shuichi Matsuda;Masato Fujinaga;Yaichirou Watakabe;Hitoshi Nagata
- 会议名称：《Annual SPIE conference on Integrated circuit metrology, inspection, and process control》 | 1991年
3.Photoresist dissolution rates: a comparison of puddle spray and immersion processes

机译：光致抗蚀剂溶出速率：水坑喷雾和浸渍过程的比较
- 作者：Stewart A. Robertson;J.T. Stevenson;Robert J. Holwill;Mark Thirsk;Ivan S. Daraktchiev;Steven G. Hansen
- 会议名称：《Annual SPIE conference on Integrated circuit metrology, inspection, and process control》 | 1991年
4.Linewidth measurement comparison between a photometric optical microscope and a scanning electron microscope backed with Monte Carlo trajectory computations

机译：光度光学显微镜和扫描电子显微镜与蒙特卡罗轨迹计算支持的线宽测量比较
- 作者：John W. Nunn;Nicholas P. Turner
- 会议名称：《Annual SPIE conference on Integrated circuit metrology, inspection, and process control》 | 1991年
5.X-ray laminography analysis of ultra-fine-pitch solder connections on ultrathin boards

机译：超细音调焊料连接在超薄板上的X射线灯光图分析
- 作者：John A. Adams
- 会议名称：《Annual SPIE conference on Integrated circuit metrology, inspection, and process control》 | 1991年
6.Linearity of coherence probe metrology: simulation and experiment

机译：相干性探测计量的线性度：模拟与实验
- 作者：Mark P. Davidson;Kevin M. Monahan;Robert J. Monteverde
- 会议名称：《Annual SPIE conference on Integrated circuit metrology, inspection, and process control》 | 1991年
7.Figure of merit for calibration and comparison of linewidth measurement instruments

机译：线宽测量仪器校准和比较的优点
- 作者：Robert R. Hershey;Terrence E. Zavecz
- 会议名称：《Annual SPIE conference on Integrated circuit metrology, inspection, and process control》 | 1991年
8.Automated wafer inspection in the manufacturing line

机译：制造线上的自动晶圆检查
- 作者：Jeanne E. Harrigan;Meryl D. Stoller
- 会议名称：《Annual SPIE conference on Integrated circuit metrology, inspection, and process control》 | 1991年
9.Sequential experimentation strategy and response surface methodologies for photoresist process optimization

机译：光致抗蚀剂过程优化的顺序实验策略与响应面方法
- 作者：Gary E. Flores;David H. Norbury
- 会议名称：《Annual SPIE conference on Integrated circuit metrology, inspection, and process control》 | 1991年
10.Optimal control of positive optical photoresist development

机译：正光学光致抗蚀剂发育的最佳控制
- 作者：Thomas A. Carroll;W.F. Ramirez
- 会议名称：《Annual SPIE conference on Integrated circuit metrology, inspection, and process control》 | 1991年
11.Characterization of automatic overlay measurement technique for sub-half-micron devices

机译：子半微米器件自动覆盖测量技术的表征
- 作者：Akira Kawai;Keiji Fujiwara;Kouichirou Tsujita;Hitoshi Nagata
- 会议名称：《Annual SPIE conference on Integrated circuit metrology, inspection, and process control》 | 1991年
12.Phase-shift mask pattern accuracy requirements and inspection technology

机译：相移掩模图案精度要求和检测技术
- 作者：James N. Wiley;Tao-Yi Fu;Takashi Tanaka;Susumu Takeuchi;Satoshi Aoyama;Junji Miyazaki;Yaichirou Watakabe
- 会议名称：《Annual SPIE conference on Integrated circuit metrology, inspection, and process control》 | 1991年
13.Thickness measurement of combined a-Si and Ti films on c-Si using a monochromatic ellipsometer

机译：使用单色椭圆仪对C-Si组合A-Si和Ti膜的厚度测量
- 作者：Chue-San Yoo;Jan C. Jans
- 会议名称：《Annual SPIE conference on Integrated circuit metrology, inspection, and process control》 | 1991年
14.Electron-beam metrology: the European initiative

机译：电子束计量：欧洲倡议
- 作者：James J. Jackman
- 会议名称：《Annual SPIE conference on Integrated circuit metrology, inspection, and process control》 | 1991年
15.Techniques for characterization of silicon penetration during DUV surface imaging

机译：DUV表面成像期间硅渗透表征技术
- 作者：Peter W. Freeman;John F. Bohland;Edward K. Pavelchek;Susan K. Jones;Bruce W. Dudley;Stephen M. Bobbio
- 会议名称：《Annual SPIE conference on Integrated circuit metrology, inspection, and process control》 | 1991年
16.Metrology issues associated with submicron linewidths

机译：与亚微米线宽相关的计量问题
- 作者：Khoi Phan;John L. Nistler;Bhanwar Singh
- 会议名称：《Annual SPIE conference on Integrated circuit metrology, inspection, and process control》 | 1991年
17.Charging phenomena in e-beam metrology

机译：电子束计量中的充电现象
- 作者：Dorron D. Levy;Karl L. Harris
- 会议名称：《Annual SPIE conference on Integrated circuit metrology, inspection, and process control》 | 1991年
18.Advanced confocal technique for submicron CD measurements

机译：亚微米CD测量的先进的共焦技术
- 作者：Axel Rohde;Ralf Saffert;John Fitch
- 会议名称：《Annual SPIE conference on Integrated circuit metrology, inspection, and process control》 | 1991年
19.Optical metrology for integrated circuit fabrication

机译：集成电路制造的光学计量
- 作者：Stanley S. Chim;Gordon S. Kino
- 会议名称：《Annual SPIE conference on Integrated circuit metrology, inspection, and process control》 | 1991年
20.Phase-shift mask technology: requirements for e-beam mask lithography

机译：相移掩模技术：电子束掩模光刻要求
- 作者：Steven K. Dunbrack;Andrew Muray;Charles Sauer;Richard Lozes;John L. Nistler;William H. Arnold;David F. Kyser;Anna M. Minvielle;Moshe E. Preil;Bhanwar Singh;Michael K. Templeton
- 会议名称：《Annual SPIE conference on Integrated circuit metrology, inspection, and process control》 | 1991年
21.Using the Atomic Force Microscope to measure submicron dimensions of integrated circuit devices and processes

机译：使用原子力显微镜测量集成电路器件和过程的亚微米尺寸
- 作者：Mark R. Rodgers;Kevin M. Monahan
- 会议名称：《Annual SPIE conference on Integrated circuit metrology, inspection, and process control》 | 1991年
22.Semiwafer metrology project

机译：半行动计量项目
- 作者：Marylyn H. Bennett;William M. Hiatt;Laurie J. Lauchlan;Lynda C. Mantalas;Hans Rottmann;Mark Seliger;Bhanwar Singh;Don E. Yansen
- 会议名称：《Annual SPIE conference on Integrated circuit metrology, inspection, and process control》 | 1991年
23.Wafer alignment based on existing microstructures

机译：基于现有微结构的晶片对齐
- 作者：Geert J. Wyntjes;Michael Hercher
- 会议名称：《Annual SPIE conference on Integrated circuit metrology, inspection, and process control》 | 1991年
24.Submicron linewidth measurement using an interferometric optical profiler

机译：亚微米线宽测量使用干涉光学分析器
- 作者：Katherine Creath
- 会议名称：《Annual SPIE conference on Integrated circuit metrology, inspection, and process control》 | 1991年
25.0.50 um contact measurement and characterization

机译：0.50 UM接触测量和表征
- 作者：Tracy K. Lindsay;Kevin J. Orvek;Richard T. Mumaw
- 会议名称：《Annual SPIE conference on Integrated circuit metrology, inspection, and process control》 | 1991年
26.Understanding metrology of polysilicon gates through reflectance measurements and simulation

机译：通过反射测量和模拟了解多晶硅盖茨的计量
- 作者：Karim H. Tadros;Andrew R. Neureuther;Roberto Guerrieri
- 会议名称：《Annual SPIE conference on Integrated circuit metrology, inspection, and process control》 | 1991年
27.Measuring films on and below polycrystalline silicon using reflectometry

机译：使用反射测量法测量多晶硅上下的薄膜
- 作者：Herbert L. Engstrom;Stanley E. Stokowski
- 会议名称：《Annual SPIE conference on Integrated circuit metrology, inspection, and process control》 | 1991年
28.Computational model of the imaging process in scanning-x microscopy

机译：扫描X显微镜中成像过程的计算模型
- 作者：Harry S. Gallarda;Ramesh C. Jain
- 会议名称：《Annual SPIE conference on Integrated circuit metrology, inspection, and process control》 | 1991年
29.Adaptive control of photolithography

机译：光刻的自适应控制
- 作者：Oscar D. Crisalle;Robert A. Soper;Duncan A. Mellichamp;Dale E. Seborg
- 会议名称：《Annual SPIE conference on Integrated circuit metrology, inspection, and process control》 | 1991年
30.Optical polysilicon over oxide thickness measurement

机译：光多晶硅在氧化物厚度测量上
- 作者：Anne M. Kaiser
- 会议名称：《Annual SPIE conference on Integrated circuit metrology, inspection, and process control》 | 1991年
31.Use of diffracted light from latent images to improve lithography control

机译：使用衍生图像的衍射光来改善光刻控制
- 作者：Kirt C. Hickman;Susan M. Wilson;Kenneth P. Bishop;S.S. Naqvi;John R. McNeil;Gary D. Tipton;Brian R. Stallard;B.L. Draper
- 会议名称：《Annual SPIE conference on Integrated circuit metrology, inspection, and process control》 | 1991年
32.Numerical simulation of thick-linewidth measurements by reflected light

机译：反射光线厚线宽度测量的数值模拟
- 作者：Gregory L. Wojcik;John Mould;Robert J. Monteverde;Jaroslav J. Prochazka;John R. Frank
- 会议名称：《Annual SPIE conference on Integrated circuit metrology, inspection, and process control》 | 1991年
33.In-line wafer inspection using 100-megapixel-per-second digital image processing technology

机译：使用100万像素的数字图像处理技术在线晶圆检查
- 作者：Gary Dickerson;Rick P. Wallace
- 会议名称：《Annual SPIE conference on Integrated circuit metrology, inspection, and process control》 | 1991年
34.Using an expert system to interface mainframe computing resources with an interactive video system

机译：使用专家系统与交互式视频系统接口大型机计算资源
- 作者：Raymond Carey;Sheryl F. Wible;Wayne H. Gaynor;Timothy G. Hendry
- 会议名称：《Annual SPIE conference on Integrated circuit metrology, inspection, and process control》 | 1991年
35.Cross-sectional imaging in SEM: signal formation mechanism and CD measurements

机译：SEM中的横截面成像：信号形成机制和CD测量
- 作者：Leon A. Firstein;Arthur Noz
- 会议名称：《Annual SPIE conference on Integrated circuit metrology, inspection, and process control》 | 1991年
36.Semiconductor thin-film optical constant determination and thin-film thickness measurement equipment correlation

机译：半导体薄膜光学恒定确定和薄膜厚度测量设备相关性
- 作者：Anne M. Kaiser
- 会议名称：《Annual SPIE conference on Integrated circuit metrology, inspection, and process control》 | 1991年
37.Effects of wafer cooling characteristics after post-exposure bake on critical dimensions

机译：曝光后烘烤后晶片冷却特性对临界尺寸的影响
- 作者：Teresa L. Lauck;Masafumi Nomura;Tsutae Omori;Kajutoshi Yoshioka
- 会议名称：《Annual SPIE conference on Integrated circuit metrology, inspection, and process control》 | 1991年
38.Charging effects in low-voltage SEM metrology

机译：低压SEM计量中的充电效果
- 作者：Kevin M. Monahan;Jozef P. Benschop;Tom A. Harris
- 会议名称：《Annual SPIE conference on Integrated circuit metrology, inspection, and process control》 | 1991年
39.Edge-profile materials and protective coating effects on image quality

机译：边缘型材和保护涂层对图像质量的影响
- 作者：Takeshi Doi;Karim H. Tadros;Birol Kuyel;Andrew R. Neureuther
- 会议名称：《Annual SPIE conference on Integrated circuit metrology, inspection, and process control》 | 1991年
40.Effect of operating points in submicron CD measurements

机译：亚微米CD测量工作点的影响
- 作者：Mircea V. Dusa;Christoph Jung;Paul Jung;Detlef Hogenkamp;Klaus-Dieter Roeth
- 会议名称：《Annual SPIE conference on Integrated circuit metrology, inspection, and process control》 | 1991年
41.Extending electrical measurements to the 0.5 um regime

机译：将电气测量扩展到0.5 um制度
- 作者：Patrick M. Troccolo;Lynda C. Mantalas;Richard A. Allen;Loren W. Linholm
- 会议名称：《Annual SPIE conference on Integrated circuit metrology, inspection, and process control》 | 1991年
42.Monte Carlo modeling of secondary electron signals from heterogeneous specimens with nonplanar surfaces

机译：非均质标本与非平面曲面的二次电子信号的蒙特卡罗建模
- 作者：John C. Russ;Bruce W. Dudley;Susan K. Jones
- 会议名称：《Annual SPIE conference on Integrated circuit metrology, inspection, and process control》 | 1991年
43.Surface roughness effects on light scattered by submicron particles on surfaces

机译：表面粗糙度对亚微米粒子散射在表面上的光
- 作者：Edward J. Bawolek;Edwin D. Hirleman
- 会议名称：《Annual SPIE conference on Integrated circuit metrology, inspection, and process control》 | 1991年
44.Critical dimension control using development end point detection for wafers with multilayer structures

机译：使用多层结构的晶片的开发端点检测关键尺寸控制
- 作者：Toshio Hagi;Yoshimitsu Okuda;Tohru Ohkuma
- 会议名称：《Annual SPIE conference on Integrated circuit metrology, inspection, and process control》 | 1991年
45.Resist tracking: a lithographic diagnostic tool

机译：抗蚀性跟踪：光刻诊断工具
- 作者：Cliff H. Takemoto;David H. Ziger;William Connor;Romelia Distasio
- 会议名称：《Annual SPIE conference on Integrated circuit metrology, inspection, and process control》 | 1991年