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Pure-shear mode BAW resonator consisting of (112#x0304;0) textured AlN films

机译:纯剪切模式BAW谐振器由(112˚0)纹理化ALN薄膜组成

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In-plane and out-of-plane oriented (11 2̄ 0) textured AlN thin films are attractive for shear mode piezoelectric devices and sensors, such as FBAR and SH-SAW devices. It is proposed here that highly oriented (11 2̄0) AlN thin films can be fabricated using ion beam sputter-deposition system with grazing incidence to the substrate surface. Full-width-at-half-maximum (FWHM) values of the ω-scan rocking curve and φ-scan profile curves of the (11 2̄2) X-ray diffraction poles were measured to be 4.6° and 23°, respectively. Shear-mode high-overtone acoustic resonator (HBAR) with (11 2̄0) textured AlN film excited pure-shear wave without any longitudinal wave excitation. New device structure is expected because this film can be deposited on various substrates and curved surfaces.
机译:在平面内和面内导向(11 2×0)纹理化的ALN薄膜对于剪切模式压电装置和传感器具有吸引力,例如FBAR和SH锯装置。这里提出了高度取向的(112-0)ALN薄膜,可以使用离子束溅射沉积系统制造具有放牧入射到基板表面的离子束溅射沉积系统。 (112̄2)X射线衍射极的Ω扫描摇摆曲线和φ-扫描轮廓曲线的全宽半最大(FWHM)值分别为4.6°和23°。带有(11 2×0)纹理的ALN膜激发纯剪切波的剪切模式高泛音声谐振器(HBB),无需任何纵向波动激发。预期新的器件结构是因为该胶片可以沉积在各种基板上和弯曲的表面上。

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