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Technical Standards, Purifying Methods and Application for Ultrapure Hydrogen

机译:技术标准,纯化方法及纯氢的应用

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At present the requirements of ultrapure hydrogen are increasing with the developnment of material industry. The ultrapure hydrogen has been extensively used in produciton fields for semiconductor material, optical fibre, magnetic material, hard alloy, floating glass and catalyst of chemical industry etc. Due to commercial hydrogen puirty is generally up to 99.5-99.9% but the hydrogen purity applied in semiconductor industry is over 99.9999%, therefore the hydrogen finement purifier must be ued for purifying treatment, The past methods of purifying hydrogen were diffusion of palladium alloy membrane, c atalyzing and cryogenic adsorption etc. The method of metal hydride developed in resent years is gradually becoming practical application. The paper introduces various technical standards of ultrapure hydrogen, requirements of hydrogen purity in microelectronic industry and hydrogen purity treated by various fine methods. At the end, the paper describes practical application examples for hdyrogen purifier wiht the methods of metal hydride.
机译:目前纯氢的要求随着材料工业的开发而增加。由于商业氢保护,超氢气过多地用于半导体材料,光纤,磁性材料,硬质合金,化学工业催化剂等浮动玻璃和化学工业催化剂。通常施加氢纯度但施加氢纯度。施加氢纯度均为高达99.5-99.9%,但施加氢纯度在半导体工业中超过99.9999%,因此必须将氢气细粉净化器净化处理,过去纯化钯的过去的方法是钯合金膜,C alalyzing和低温吸附等。在怨恨岁月中发育的金属氢化物方法是逐渐成为实际应用。本文介绍了超纯度的各种技术标准,微电子工业中的氢纯度要求和各种精细方法处理的氢纯度。最后,本文描述了金属氢化物方法的霍氏净化器的实际应用实例。

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