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Hydrogen annealing effect on L10 ordering of CoPt thin films

机译:对CPT薄膜L10排序的氢退火效应

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L1_0-ordered CoPt is one of the next-generation ferromagnetic materials due to its highperpendicular magnetocrystalline anisotropy and high coercivity. The ordered phase is attributed tophase transformation from A1-disordered CoPt by thermal annealing. Rapid thermal annealing (RTA)is considered as a promising annealing technique to induce phase transformation and obtainL1_0-ordered CoPt owing its high heating rate. Considering future applications to spintronic devices,hydrogen annealing is effective to enhance structural and magnetic properties of L1_0-ordered CoPt.Therefore, it is important to study the effect of hydrogen annealing of RTA on L1_0 ordering of CoPt.However, detail studies on the effect on crystal structures of CoPt thin films have not been reported.In this study, we fabricate Co/Pt multilayer thin films on Si/SiO_2 substrates by electron-beamevaporation. These films are subsequently annealed by RTA under a vacuum or an Ar/H_2 atmosphere.Their crystal structures are characterized by grazing incidence X-ray diffraction (GI-XRD) usingsynchrotron radiation at KEK (BL-8B).
机译:L1_0订购的COPT是下一代铁磁材料之一,因为它很高垂直磁镀各向异性和高矫顽力。订购的阶段归因于通过热退火从A1无序的Copt相变。快速热退火(RTA)被认为是一个有前途的退火技术,用于诱导相变和获得L1_0订购的COPT其高加热速率。将未来应用程序考虑到旋转式设备,氢退火是有效增强L1_0订购的Copt的结构和磁性。因此,研究RTA对COPT的L1_0排序氢退火的影响。然而,没有报道关于COPT薄膜晶体结构的影响的细节研究。在这项研究中,通过电子束在Si / SiO_2基板上制造CO / PT多层薄膜蒸发。随后在真空或Ar / H_2大气下通过RTA来退回这些膜。它们的晶体结构的特征在于使用涂覆X射线衍射(GI-XRD)Kek(BL-8B)的同步辐射。

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