A silicon wafer bonding process is described in which only thermally grown oxide is present between wafer pairs. Bonding occurs after insertion into an oxidizing ambient. It is proposed the wafers are drawn into intimate contact as a result of the gaseous oxygen between them being consumed by oxidation, thus producing a partial vacuum. The proposed bonding mechanism is polymerization of silanol bonds between wafer pairs. A preferential etch-back process is used to produce Silicon-on-insulator (SOI) whose electrical quality is equal to that of bulk silicon. Capacitor measurements show a 27 µsec minority carrier lifetime and low Qssat the SOI-"bottom oxide" interface, in addition, there is negligible charge within the bonding oxide. N-channel and p-channel FET devices show threshold voltages and mobilities equal to bulk controls. The subthreshold leakage is less than 1 fA per micron of channel width.
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机译:描述了硅晶片键合工艺,其中在晶片对之间仅存在热生长的氧化物。插入氧化环境后发生键合。由于晶片之间的气态氧被氧化消耗,因此提出使晶片紧密接触。提出的键合机制是晶片对之间硅烷醇键的聚合。使用优先的回蚀工艺来生产绝缘质量良好的硅(SOI),其电质量与块状硅相同。电容器测量结果表明,在SOI-“底部氧化物”界面处的少数载流子寿命为27微秒,Q ss inf>低,此外,键合氧化物内部的电荷可忽略不计。 N沟道和p沟道FET器件显示的阈值电压和迁移率等于批量控制。每阈值沟道宽度的亚阈值泄漏小于1 fA。
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