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Secondary emission measurements of semiconductors and dielectrics

机译:半导体和电介质的二次发射测量

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A measuring technique is described whereby the secondary emission ratio can be determined using a special experimental set-up employing two electron guns in a demountable vacuum system plus associated electronics. Although originally set up for measurements of semiconductors, the apparatus has also been used for measurement of insulators. The principal features of this technique are: (1) use of a flood electron gun to place the target surface at some voltage, and (2) the use of an amplitude modulated probing electron beam and a narrow-band amplifier at the target to detect the collected probing current at the target. The collection of the probing electron beam occurs when its cathode is more negative than the secondary emitting surface. By positioning the cathode voltage, the surface voltage can be determined as well as the landing energy of the flood electrons. Secondary emission measurements on semiconductors are described for primary energy from 0 eV through first cross-over to several hundred eV. Measurements taken on dielectrics are described from first cross-over to approximately 50 eV above maximum. Advantages of using a measuring technique in which the surface voltage of the target material does not vary are described. This apparatus was used to perform tests on contract DA-44-009-ENG-4868 for U.S. Army Engineer Research and Development Laboratories, Ft. Belvoir, Va.
机译:描述了一种测量技术,可以使用可拆卸的真空系统中的两个电子枪以及相关的电子装置,通过特殊的实验装置确定二次发射率。尽管最初是为测量半导体而设置的,但该设备也已用于绝缘体的测量。该技术的主要特征是:(1)使用泛电子枪将目标表面置于一定电压下;(2)在目标处使用调幅探测电子束和窄带放大器进行检测在目标处收集的探测电流。当探测电子束的阴极比次级发射表面负电时,将发生探测电子束的收集。通过定位阴极电压,可以确定表面电压以及泛电子的着陆能量。描述了半导体的二次发射测量,其主要能量从0 eV到第一次穿越到几百eV。介电常数的测量范围是从第一次穿越到最大最大值约50 eV。描述了使用其中靶材的表面电压不变的测量技术的优点。该设备用于对美国陆军工程师研究与开发实验室(Ft。)的合同DA-44-009-ENG-4868进行测试。弗吉尼亚州贝尔沃

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