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An Experimental Study on Mechanism of Precision Lapping Quartz Wafer

机译:精密研磨石英晶片机理的实验研究

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摘要

A lapping test for quartz wafer has been done on planetary plane-parallel lapping machine. Under different conditions of lapping plate materials, abrasive grain sizes and lapping parameters, the surface roughness and material removal rate have been measured. The lapped surface of quartz wafer and the surface of lapping plates inlaid with abrasive grain have been observed by SEM and stereomicroscope. Based on this experimental investigation, the lapping mechanism of quartz wafer has been explored in this paper too.
机译:已在行星平面平行研磨机上对石英晶片进行了研磨测试。在研磨板材料,磨料粒度和研磨参数的不同条件下,已测量了表面粗糙度和材料去除率。用SEM和立体显微镜观察了石英晶片的研磨表面和磨料镶嵌的研磨板表面。在此实验研究的基础上,本文还探讨了石英晶片的研磨机理。

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