首页> 外文会议>Electron Devices Meeting, 2004. IEDM Technical Digest. IEEE International >SiGe HBT technology with fmax/fT=350/300 GHz and gate delay below 3.3 ps
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SiGe HBT technology with fmax/fT=350/300 GHz and gate delay below 3.3 ps

机译:f max / f T = 350/300 GHz且栅极延迟低于3.3 ps的SiGe HBT技术

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This work reports on SiGe HBT technology with fmax and fT of 350 GHz and 300 GHz, respectively, and a gate delay below 3.3 ps. This is the highest reported speed for any Si-based transistor in terms of combined performance of fmax and fT both of which exhibit 300 GHz and above. Associated BVCEO and BVCBO are measured to be 1.7 V and 5.6 V, respectively. The dependence of device performance on bias condition and device dimension has been investigated. Considerations regarding the extraction of such high fmax and fT values are also discussed.
机译:这项工作报告了SiGe HBT技术,分别具有350 GHz和300 GHz的F MAX 和F T ,以及低于3.3 PS的栅极延迟。这是任何SI基晶体管的最高报告的速度,在F MAX 和F T 两者的组合性能方面都表现出300 GHz及以上。相关的BV CEO 和BV cbo>分别测量为1.7 V和5.6 V.研究了设备性能对偏置条件和装置尺寸的依赖性。还讨论了关于这种高f max 和f t 值的提取的考虑。

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