首页> 外文会议>High Density Microsystem Design and Packaging and Component Failure Analysis, 2006. HDP'06. Conference on >Role of Cu contents in the isothermal metallurgical reaction for the flip chip Sn-3.0Ag-0.5 or 1.5Cu joints with Cu/electroless Ni-P/immersion Au bonding pad during aging
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Role of Cu contents in the isothermal metallurgical reaction for the flip chip Sn-3.0Ag-0.5 or 1.5Cu joints with Cu/electroless Ni-P/immersion Au bonding pad during aging

机译:铜含量在时效过程中含铜/化学镍-磷/浸金键合的倒装芯片Sn-3.0Ag- 0.5或1.5 Cu接头在等温冶金反应中的作用

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Cu/electroless Ni/immersion Au metallization is usually used as bonding pad on the substrate side of flip chip solder joints. Sn-Ag-Cu solder is one of the promising candidates to replace the conventional Sn-Pb solder. Isothermal interfacial reaction in Sn-3.0Ag-(0.5 or 1.5)Cu solder joints with electroless Ni/immersion Au surface finish after aging at 150degC was investigated in this study. Intermetallic compounds (IMC) of (Cu1-y,Niy)6Sn5 , (Ni1-x,Cux)3Sn4 and P-rich layer formed between the solder and the EN layer in both Sn-Ag-Cu joints during aging. For the Sn-3.0Ag-0.5Cu joints after more than 2000 h aging, (Ni1-x,Cux)3Sn4 IMC gradually grew. Through the investigation of cross-sectional microstructural observation and quantitative analysis, the interfacial microstructure and the elemental distribution between the solder and bonding pad could be clearly revealed. It was demonstrated that Cu content in the solders near the solder/IMC interface played an important role in the growth of (Ni1-x,Cux)3Sn 4 and (Cu1-y,Nix)6Sn5
机译:铜/化学镍/浸金金属化通常用作倒装芯片焊点基板侧的焊盘。 Sn-Ag-Cu焊料是替代常规Sn-Pb焊料的有希望的候选者之一。本研究研究了在150°C时效后化学镀Ni /浸金表面处理的Sn-3.0Ag-(0.5或1.5)Cu焊点中的等温界面反应。 (Cu 1-y ,Ni y 6 Sn 5 ,(Ni <在焊料和EN层之间形成的sub> 1-x ,Cu x 3 Sn 4 和富P层在老化过程中在两个Sn-Ag-Cu接头中都存在。对于经过2000 h以上时效的Sn-3.0Ag-0.5Cu接头,(Ni 1-x ,Cu x 3 Sn < sub> 4 IMC逐渐成长。通过对断面显微组织的观察和定量分析的研究,可以清楚地揭示出焊料与焊盘之间的界面微结构和元素分布。结果表明,焊料/ IMC界面附近的焊料中的Cu含量对(Ni 1-x ,Cu x 3的生长起着重要作用。 Sn 4 和(Cu 1-y ,Ni x 6 Sn 5

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