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Method of improving the bondability between Au wires and Cu bonding pads

机译:改进金线与铜焊盘之间可焊性的方法

摘要

Cu, for its rather low resistivity, will be widely used in sub-quarter micron meter ULSI devices. However, it is well known that Cu is easy to be corroded as exposed in air. In packaging of chips the bonding pads making of Cu will thus oxides. In addition, the reaction between Au-ball and Cu pads is very poor. On the other hand, a native AlOx layer, about 3-4 nm in thickness, will form as Al exposes in air; the formed layer is inert and is capable of protecting Al from corrosion. Furthermore, the reaction between Au-ball and Al was very well. Therefore, with the methods of the present invention, Al or AlCu as a glue and protection layer is implemented on Cu bonding pads for successful Au wiring.
机译:铜由于其较低的电阻率,将被广泛用于亚微米级的ULSI装置。然而,众所周知,Cu暴露于空气中时容易被腐蚀。在芯片的包装中,由铜制成的结合垫将因此被氧化。另外,金球和铜垫之间的反应非常差。另一方面,当Al暴露在空气中时,会形成厚度约为3-4 nm的原生AlOx层。所形成的层是惰性的并且能够保护Al免受腐蚀。此外,金球和铝之间的反应非常好。因此,利用本发明的方法,在铜键合焊盘上实施作为胶粘剂和保护层的Al或AlCu,以成功进行Au布线。

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