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Ellipsometric studies and scanning electron microscopy of Cd_(1-x)Mn _xTe films and layers modified by laser irradiation

机译:激光辐照改性Cd_(1-x)Mn _xTe薄膜和层的椭偏研究和扫描电子显微镜

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The graphical-analytical method was used to find the solution of the inverse problem in ellipsometry for the systemconsisting of a transparent single-layer dielectric film on the Cd_(1-x)Mn_xTe crystal substrate. The nomograms in the -ellipsometric coordinates were simulated to determine the refractive index of the film and its thickness for differentincidence angles of the laser beam with 632.8 nm wavelength. The treatment of the Cd_(1-x)Mn_xTe (х=0.1-0.4) thin filmsand crystal surfaces was carried out with the millisecond (τ=1.5 ms) and nanosecond (τ=80 ns) laser. The structuralphasetransformations of the films and layers in the Cd-Mn-Te system were studied in the AFM and SEM, and theirellipsometric characteristics were determined using photometric laser ellipsometer. The heterogeneity of the thicknessand structure of the laser-modified Cd_(1-x)Mn_xTe surface layers were analyzed using calculated distribution of therefractive index of the films and its dependence on the incidence angle of the laser beam.
机译:使用图形分析方法在系统的椭圆偏光法中找到反问题的解 由在Cd_(1-x)Mn_xTe晶体基板上的透明单层介电膜组成。 -中的列线图 模拟椭偏坐标以确定薄膜的折射率及其厚度 波长为632.8 nm的激光束的入射角。 Cd_(1-x)Mn_xTe(х= 0.1-0.4)薄膜的处理 晶体表面是用毫秒(τ= 1.5 ms)和纳秒(τ= 80 ns)激光进行的。结构阶段 在原子力显微镜和扫描电镜中研究了Cd-Mn-Te体系中薄膜和层的相变及其变化 使用光度激光椭偏仪测定椭偏特征。厚度的异质性 激光改性的Cd_(1-x)Mn_xTe表面层的结构和结构使用计算得到的Cd_(1-x)Mn_xTe分布进行了分析。 薄膜的折射率及其对激光束入射角的依赖性。

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