Self-supporting tantalum masks for deep x-ray lithography with synchrotron radiation

摘要

Abstract: Development of the present-day technologies ofmanufacturing deep structures with submicron elementsbased on the deep x- ray lithography method with theusage of synchrotron radiation. Microelectronics usedx-ray patterns with a 1.0 $mu@m golden masking coveringon different-type membranes become of unfit in thiscase both from the angle of contrast and from thestandpoint of radiation and heat stability. X- raypatterns with the membrane on the base of tantalum 2$mu@m thick, that are high contrasting as tosynchrotron radiation with wavelength of 0.2 to 1.0 nm,have been developed and manufactured. A set of pores0.7 $mu@m in diameter 1.5 $mu@m apart in two directionswas formed as the topological pattern. !3