首页> 外文会议>39th Annual Symposium on Frequency Control. 1985 >Etching Study of AT-Cut Cultured Quartz Using Etchants Containing Fluoride Salts, Hydrofluoric Acid, and Ammonium Bifluorlde

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Etching Study of AT-Cut Cultured Quartz Using Etchants Containing Fluoride Salts, Hydrofluoric Acid, and Ammonium Bifluorlde

机译：使用含氟盐，氢氟酸和双氟化铵的蚀刻剂对AT切割的石英进行蚀刻研究

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《39th Annual Symposium on Frequency Control. 1985》||p.271-275|共5页
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Bernot A.J.;
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1. A model of the mechanism of the chemical interaction of the etchant ion (HF2)(-) with silicon during its electrochemical etching in hydrofluoric acid solutions [J] . Abramova E. N., Khort A. M., Gvelesiani A. A., Doklady Chemistry . 2016,第Pta1期

机译：氢氟酸溶液中腐蚀离子（HF2）（-）与硅化学腐蚀过程中化学相互作用机理的模型
2. The role of the etchant ion in the formation and growth of pores in silicon during its etching in hydrofluoric acid solutions [J] . Abramova E. N., Khort A. M., Tsygankov V. N., Doklady Chemistry . 2016,第Pta1期

机译：在氢氟酸溶液中蚀刻期间，蚀刻剂离子在硅孔的形成和生长中的作用
3. The effect of the hydrofluoric acid etchant-silicon system anisotropy on the shape of pores formed upon electrochemical etching of silicon [J] . Abramova E. N., Khort A. M., Syrov Yu. V., Doklady Chemistry . 2015,第Pta1期

机译：氢氟酸腐蚀剂-硅系统的各向异性对电化学腐蚀硅时形成的孔的形状的影响
4. Characterization of Cultured Quartz for Use in Precision AT-Cut Quartz Resonators [C] . Sherman J.H. Jr. 28th Annual Symposium on Frequency Control. 1974 . -1

机译：用于精密AT切割石英谐振器的培养石英的特性
5. Cellular response of one-dimensional silicon nanowires and the effect of etching silicon (111) substrates with hydrofluoric acid prior to nanowire growth. [D] . Tanaudommongkon, Asama. 2009

机译：一维硅纳米线的细胞响应以及在纳米线生长之前用氢氟酸蚀刻硅（111）基板的效果。
6. Periodicities in the roughness and biofilm growth on glass substrate with etching time: Hydrofluoric acid etchant [O] . Susmita Chatterjee, Nupur Biswas, Alokmay Datta, -1

机译：蚀刻时间在玻璃基板上的粗糙度和生物膜生长的周期性：氢氟酸蚀刻剂
7. Periodicities in the roughness and biofilm growth on glass substrate with etching time: Hydrofluoric acid etchant [O] . Susmita Chatterjee, Nupur Biswas, Alokmay Datta, 2019

机译：熔化时间玻璃基板上的粗糙度和生物膜生长的周期性：氢氟酸蚀刻剂
8. Elimination of Damage to Metallograph Objective Lenses by Etchants Containing Hydrofluoric Acid [R] . Richardson, J. H. 1967

机译：用含有氢氟酸的蚀刻剂消除金相物镜物镜的损坏

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