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Effect of grade doping buffer layer on SEE failure in VDMOSFET

机译:等级掺杂缓冲层对VDMOSFET中检测失败的影响

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Single event burnout (SEB) is a common single event effect (SEE) occur in VDMOSFET, previous studies have indicated the strong relationship between the device's secondary breakdown voltage and the SEB threshold voltage. This paper presents a grade doping buffer layer structure to improve the device's secondary breakdown voltage so that enhance the resistance to SEE. Through detailed simulation, it has been verified that optimized grade doping buffer layer can decrease the peak value of the electric field, significantly improve the parasitic bipolar turn-on current and the SEB threshold voltage. Moreover, compared to non-buffer layer and constant doping buffer layer structure, the optimized grade doping buffer structure is a more effective structure in SEE hardened VDMOSFET.
机译:单个事件烧坏(SEB)是一个常见的单一事件效果(参见)在VDMOSFET中发生,之前的研究表明了设备的二次击穿电压和SEB阈值电压之间的强烈关系。本文介绍了一种等级掺杂缓冲层结构,以改善器件的二次击穿电压,从而增强了耐受性的电阻。通过详细的仿真,已经验证了优化的级掺杂缓冲层可以降低电场的峰值,显着改善寄生双极导通电流和SEB阈值电压。此外,与非缓冲层和恒定掺杂缓冲层结构相比,优化的级掺杂缓冲液结构是一种更有效的结构在SEED硬化的VDMOSFET中。

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