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Effect of grade doping buffer layer on SEE failure in VDMOSFET

机译:梯度掺杂缓冲层对VDMOSFET中SEE失效的影响

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Single event burnout (SEB) is a common single event effect (SEE) occur in VDMOSFET, previous studies have indicated the strong relationship between the device's secondary breakdown voltage and the SEB threshold voltage. This paper presents a grade doping buffer layer structure to improve the device's secondary breakdown voltage so that enhance the resistance to SEE. Through detailed simulation, it has been verified that optimized grade doping buffer layer can decrease the peak value of the electric field, significantly improve the parasitic bipolar turn-on current and the SEB threshold voltage. Moreover, compared to non-buffer layer and constant doping buffer layer structure, the optimized grade doping buffer structure is a more effective structure in SEE hardened VDMOSFET.
机译:单事件烧断(SEB)是VDMOSFET中常见的单事件效应(SEE),先前的研究表明该器件的二次击穿电压与SEB阈值电压之间存在很强的关系。本文提出了一种梯度掺杂缓冲层结构,以改善器件的二次击穿电压,从而增强抗SEE的能力。通过详细的仿真,已证明优化的梯度掺杂缓冲层可以降低电场的峰值,显着提高寄生双极导通电流和SEB阈值电压。此外,与非缓冲层和恒定掺杂缓冲层结构相比,优化级掺杂缓冲结构在SEE硬化VDMOSFET中是更有效的结构。

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