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High power microwave device temperature measurement - Methodology and applications for pulsed devices

机译:高功率微波器件温度测量 - 脉冲装置的方法论和应用

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摘要

Pulsed high power microwave devices are critical to tie transmitter in applications such as modern RADAR and MRI. Large peak RF powers (~250W) are needed at high pulse rates (~10KHz). Thermal management is critical to ensure device performance and reliability. Infrared microscopy measurement method is refined by synchronizing temperature detection with pulsed power stimuli to the device, thus true peak device temperatures are measured. Methodology is presented with data for two Si LDMOS microwave power devices (250W, 1GHz and 120W, 3.5GHz).
机译:脉冲高功率微波器件对于将变送器串联在现代雷达和MRI等应用中至关重要。高脉冲率(〜10kHz)需要大峰值RF功率(〜250W)。热管理对于确保设备性能和可靠性至关重要。通过将温度检测与脉冲功率刺激与器件同步温度检测来改进红外显微镜测量方法,从而测量真正的峰值装置温度。方法提供了两个SI LDMOS微波功率器件(250W,1GHz和120W,3.5GHz)的数据。

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