Large Third-Order Nonlinearities in Atomic Layer Deposition Grown Nitrogen-Enriched TiO2 Nanoscale Films

摘要

Nonlinear refractive index, n2, values as high as 1±.1x10^-9 cm²/W were measured in atomic layer deposition (ALD) grown TiO2 nanoscale films, using femtosecond thermally managed Z-scan. The several order of magnitude increase in n2 is believed due to the incorporation of nitrogen during growth.