Metalens with Fixed-Gap Nanopillars for Immersion Lithography Patterning on 12-Inch Glass Wafer

摘要

Metalens with fixed-gap nanopillars release fabrication challenges in photolithography on CMOS platform. Their performances are investigated through simulation, and the characterization results of metalens patterned directly on 12-inch glass-wafer via immersion lithography are presented.