Large-Area Metalens Directly Patterned on a 12-Inch Glass Wafer using Immersion Lithography for Mass Production

摘要

We developed a technology to directly process 12-inch glass wafers using 193 nm immersion lithography for metasurface devices fabrication. An 8-mm-dimeter metalens working at 940 nm wavelength has been demonstrated as a proof-of-concept functional device.