2/TiN RRAM performance is investiga'/> Impact of Forming Voltage Polarity on HfO<inf>2</inf>-based RRAM Performance
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Impact of Forming Voltage Polarity on HfO2-based RRAM Performance

机译:电压极性的形成对基于HfO 2 的RRAM性能的影响

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摘要

In this paper, the impact of forming voltage polarity on Pt/HfO2/TiN RRAM performance is investigated. Experimental results show that performance including forming voltage and resistance ratio can be improved by tuning the forming voltage polarity at the inert electrode. The underlying mechanism may be the suppression of the filament overgrowing by the reverse forming voltage.
机译:本文研究了电压极性对Pt / HfO的影响 2 / TiN RRAM性能进行了研究。实验结果表明,通过调节惰性电极上的形成电压极性,可以改善包括形成电压和电阻比在内的性能。潜在的机制可能是通过反向形成电压来抑制细丝过度生长。

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