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Research of controlling the optical face of CaF2 crystal elements on optical grinding and polishing

机译:CaF2晶体元素光学面在光学研磨抛光中的控制研究

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As an excellent optical element material, CaF2 crystal has a wide-spectrum transmission range and stable physicochemical properties. Due to the soft and brittle nature of CaF2 crystal, also with high coefficient of thermal expansion and low heat conductivity coefficient, it is of great significance to study the stability and characterization of the removal function during the processing of large-diameter CaF2 optical elements with specific geometric requirements. In this paper, a Φ200 mm CaF2 crystal plate was taken as the research object. The stable technique of grinding and polishing calcium fluoride is researched and the pressure is treated as the key factor. The specialized tool is designed to control the pressure. The removal model of grinding and polishing is stablished based on the specialized tool. The pressure distribution of grinding and polishing process is simulated and the optimized pressure distribution is obtained. This makes the whole face error converged efficiently and stably, meanwhile the face to face angle can be controlled precisely. As a conclusion, the PV value of experimental element is less than 0.13λ within the aperture, and the face to face angle is restrained into 5" after using new tools.
机译:CaF2晶体是一种优异的光学元件材料,具有广谱传输范围和稳定的理化特性。由于CaF2晶体的软性和脆性,同时还具有高的热膨胀系数和低的导热系数,因此研究大直径CaF2光学元件的加工过程中去除功能的稳定性和表征具有重要意义。具体的几何要求。本文以Φ200mm CaF2晶体片为研究对象。研究了氟化钙研磨抛光的稳定技术,并将压力作为关键因素。该专用工具旨在控制压力。在专用工具的基础上建立了磨削和抛光的去除模型。模拟了磨抛过程中的压力分布,得到了最优的压力分布。这样可以使整个面部误差有效而稳定地收敛,同时可以精确地控制面部之间的角度。结论是,实验元件的PV值在孔径内小于0.13λ,并且在使用新工具后,面对面的角度被限制为5英寸。

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