Optical Studies of Nanocrystalline and Amorphous TiO_2 Thin Films Deposited by HiTUS Technique

摘要

TiO_2 thin films were deposited on glass substrates by HiTUS (high target utilization sputtering) technique. Structural studies of TiO_2 thin films of different thickness were performed by X-ray diffraction. Refractive index and extinction coefficient were measured by spectroscopic ellipsometer. Transmission spectra of TiO_2 thin films were investigated in the temperature interval 77-300 K. The temperature behaviour of Urbach absorption edge for TiO_2 thin film was studied. The effect of temperature on the optical parameters and order-disorder processes in TiO_2 thin films was analysed.