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Breakdown characteristics of 12–20 kV-class 4H-SiC PiN diodes with improved junction termination structures

机译:具有改进的结终端结构的12–20 kV级4H-SiC PiN二极管的击穿特性

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摘要

Ultrahigh-voltage 4H-SiC PiN diodes with improved junction termination extension (JTE) structures have been investigated. Breakdown characteristics of 4H-SiC PiN diodes with conventional single-zone JTE was shown to be severely affected by the charge near the SiO2/SiC interface from experiment and device simulation. Taking the effect of the interface charge into account, and by using “Space-Modulated” JTE structure with a wide optimum JTE-dose window to tolerate the impact of interface charge, we achieved a breakdown voltage of 21.7 kV (81 % of the ideal breakdown voltage calculated from the epilayer structure), which is the highest breakdown voltage among any semiconductor devices ever reported.
机译:研究了具有改进的结终端扩展(JTE)结构的超高压4H-SiC PiN二极管。实验和器件仿真显示,传统的单区JTE的4H-SiC PiN二极管的击穿特性受到SiO2 / SiC界面附近电荷的严重影响。考虑到界面电荷的影响,并通过使用具有广泛最佳JTE剂量窗口的“空间调制” JTE结构来承受界面电荷的影响,我们实现了21.7 kV的击穿电压(理想值的81%由外延层结构计算得出的击穿电压),这是有史以来报道的所有半导体器件中最高的击穿电压。

著录项

  • 来源
    《》|2012年|p.381- 384|共4页
  • 会议地点 Bruges(BE)
  • 作者单位

    Department of Electronic Science and Engineering, Kyoto University, A1-303 Kyotodaigaku-katsura, Nishikyo, 615-8510, JAPAN;

  • 会议组织
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 结构、器件;
  • 关键词

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