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Electroplated bismuth absorbers for planar NTD-Ge sensor arrays applied to hard X-ray detection in astrophysics

机译:平面NTD-Ge传感器阵列的电镀铋吸收剂,用于天体物理学中的硬X射线检测

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摘要

Single sensors or small arrays of manually assembled neutron transmutation doped germanium (NTD-Ge) based microcalorimeters have been widely used as high energy-resolution detectors from infrared to hard X-rays. Several planar technological processes were developed in the last years aimed at the fabrication of NTD-Ge arrays, specifically designed to produce soft X-ray detectors. One of these processes consists in the fabrication of the absorbers. In order to absorb efficiently hard X-ray photons, the absorber has to be properly designed and a suitable material has to be employed. Bismuth offers interesting properties in terms of absorbing capability, of low heat capacity (needed to obtain high energy resolution) and deposition technical feasibility, moreover, it has already been used as absorber for other types of microcalorimeters. Here we present the electroplating process we adopted to grow bismuth absorbers for fabricating planar microcalorimeter arrays for hard X-rays detection. The process was specifically tuned to grow uniform Bi films with thickness up to ~ 70 μm. This work is part of a feasibility study for a stratospheric balloon borne experiment that would observe hard X-rays (20-100 keV) from solar corona.
机译:单个传感器或基于手工组装的中子do变掺杂锗(NTD-Ge)的微量热量计的小型阵列已被广泛用作从红外到硬X射线的高能量分辨率探测器。近年来,针对NTD-Ge阵列的制造,开发了几种平面技术工艺,专门设计用于生产软X射线探测器。这些方法之一在于吸收体的制造。为了有效地吸收硬X射线光子,必须适当设计吸收体,并且必须采用合适的材料。铋在吸收能力,低热容量(需要获得高能量分辨率)和沉积技术可行性方面具有令人感兴趣的特性,此外,它已被用作其他类型的微量热量计的吸收剂。在这里,我们介绍了用于生长铋吸收剂的电镀工艺,该工艺用于制造用于硬X射线检测的平面微热量计阵列。该工艺经过专门调整,可以生长出厚度约70μm的均匀Bi膜。这项工作是对平流层气球飞行实验进行可行性研究的一部分,该实验将观察到来自日冕的硬X射线(20-100 keV)。

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