首页> 外文会议>SPIE Advanced Lithography Conference >Evaluation of resist molds formed for fabricating micro-lens arrays and practicability of replicated epoxy resin lenses
【24h】

Evaluation of resist molds formed for fabricating micro-lens arrays and practicability of replicated epoxy resin lenses

机译:评价用于制作微透镜阵列的抗蚀剂模具和复制环氧树脂透镜的实用性

获取原文

摘要

A new fabrication method of micro-lens arrays with element lens diameters of 20-50 μm was developed in the past research. In the method, epoxy micro-lens arrays are replicated using concave resist patterns as molds. In this paper, resist mold pattern profiles were investigated again in detail, and model curves to be fitted to pattern cross sections were looked over again. As a result, it was found that cross section curves of resist mold patterns were very accurately modeled by decomposing each curve into three parts of a central circular concave arc, a peripheral circular convex arc, and a tangential line connecting them. For this reason, using the new fitting curves, how parallel light rays incident in an element lens were refracted at the lens surface, and concentrated in a spot were investigated. It was clarified by the ray trace that parallel light rays were efficiently concentrated in a considerably small light spots by grace of the tangential line parts. Next, the ray trace results were compared with the experimental results. A micro-lens array fabricated under the same conditions was illuminated by a parallel light ray flux. As a result, the position where the traced rays were concentrated almost coincided with the position obtained experimentally. The diameters of concentrated light spots estimated by the ray trace also almost coincided with the actually observed ones. Thus, optical characteristics of micro-lens arrays fabricated by the new method were adequately qualified. The new method will be useful.
机译:在过去的研究中,开发了一种新的制造微透镜阵列的方法,该微透镜阵列具有20-50μm的元件透镜直径。在该方法中,使用凹抗蚀剂图案作为模具来复制环氧微透镜阵列。在本文中,再次详细研究了抗蚀剂模具的图案轮廓,并再次查看了适合于图案横截面的模型曲线。结果,发现通过将每条曲线分解为中心圆形凹弧,外围圆形凸弧和连接它们的切线的三个部分,可以非常精确地建模抗蚀剂模具图案的横截面曲线。为此,使用新的拟合曲线,研究了入射到元件透镜中的平行光线在透镜表面如何折射并聚集在一个点上。射线迹线表明,由于切线部分的缘故,平行光线有效地聚集在相当小的光斑中。接下来,将射线迹线结果与实验结果进行比较。在相同条件下制造的微透镜阵列通过平行光束通量照射。结果,所追踪的光线会聚的位置几乎与实验获得的位置一致。由射线轨迹估计的集中光斑的直径也几乎与实际观察到的一致。因此,用这种新方法制造的微透镜阵列的光学特性是充分合格的。新方法将很有用。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号