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THE SWITCHING CHARACTERISTICS OF SUB-MICRON MEMORY ELEMENTS WITH SYNTHETIC ANTI-FERROMAGNETIC (SAF) FREE-LAYERS

机译:合成抗铁磁(SAF)自由层子微米内存元件的开关特性

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We have studied the switching characteristics of patterned synthetic anti-ferromagnetic (SAF) elements for application as a free layer in Magnetic Random Access Memory (MRAM). There has been recent interest [1], [2] in using these structures, by virtue of their lower net moment, to reduce the shape anisotropy and therefore the switching field of patterned elements. We show, however, there is also an effective amplification of the intrinsic material anisotropy in competition with the reduction in shape anisotropy.
机译:我们研究了图案化合成抗铁磁(SAF)元件的开关特性,用于应用于磁随机存取存储器(MRAM)中的自由层。凭借其较低的净时刻,近期使用这些结构的兴趣[1],[2],以减少形状各向异性,因此是图案化元件的开关领域。然而,我们展示了在竞争中有效扩增内在材料各向异性,随着形状各向异性的减少。

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