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X-ray reflectivity determination of interface roughness and correlated with magnetic coercivity of Co{sub}82Cr{sub}12Pt{sub}4Ta{sub}4 thin film

机译:X射线反射率确定界面粗糙度,与Co {Sub} 82CR {Sub} 12pt {sub} 4TA {Sub} 4薄膜相关的磁矫顽力相关

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Previous study on Co alloy thin film media showed that underlayer could have a very important role in controlling the magnetic properties of whole media film. With the development from bcc Cr underlayer to B2 NiAl underlayer and success of various intermediate layer structure design, it suggested that interfacial factors should attracts more attentions. However, it lacks direct method to detect interfaces formed in this multilayer system. Mechanism obtained from surface studies could not be simply extended to apply for interfaces On the other hand, depth-profiling techniques often experienced bombardment shift for material composition and other structure parameters.
机译:先前关于Co合金薄膜介质的研究表明,底层可以在控制整个培养基膜的磁性方面具有非常重要的作用。随着BCC CR底层的发展,B2 Nial底层和各种中间层结构设计的成功,它表明界面因素应该吸引更多的注意。然而,它缺乏检测在该多层系统中形成的接口的直接方法。从表面研究中获得的机制不能简单地扩展到另一方面涂抹界面,深度分析技术经常经历材料组成和其他结构参数的轰击变化。

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