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首页> 外文期刊>Applied Physics Letters >Determination by x-ray reflectivity and small angle x-ray scattering of the porous properties of mesoporous silica thin films
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Determination by x-ray reflectivity and small angle x-ray scattering of the porous properties of mesoporous silica thin films

机译:通过x射线反射率和小角度x射线散射测定介孔二氧化硅薄膜的多孔性能

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Two-dimensional hexagonal silica thin films templated by a triblock copolymer were investigated by grazing incident small angle x-ray scattering (GISAXS) and x-ray reflectivity (XR) before and after removing the surfactant from the silica matrix. XR curves—analyzed above and below the critical angle of the substrate—are evaluated by the matrix technique to obtain the average electron density of the films, the wall thickness, the electron density of the walls, the radius of the pores, and subsequently the porosity of such mesoporous films. In combination with GISAXS, the surface area of the mesopores is ascertained, thereby providing a complete analysis of the porosity in thin films by x-ray scattering methods.
机译:在从二氧化硅基质中除去表面活性剂之前和之后,通过掠入射小角X射线散射(GISAXS)和X射线反射率(XR)来研究由三嵌段共聚物模板化的二维六角形二氧化硅薄膜。通过矩阵技术评估XR曲线(在基材的临界角上方和下方进行分析),以获得薄膜的平均电子密度,壁厚,壁的电子密度,孔的半径以及随后的这类中孔膜的孔隙率。与GISAXS结合使用,可确定中孔的表面积,从而通过X射线散射方法对薄膜中的孔隙率提供完整的分析。

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