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Above 100-GHz low phase noise frequency generation in silicon integrated technologies

机译:硅集成技术中产生高于100 GHz的低相位噪声频率

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This paper summarizes the design techniques in integrated Silicon technologies for oscillator signal generation above fmax. It describes the general schematics using N-push techniques in oscillators and their theoretical operating principle. Furthermore, sub-harmonic injection locking is discussed as a solution for low phase noise. Finally, some examples of CMOS and BiCMOS fabricated circuits are given as a proof of concept that demonstrate the feasibility of low phase noise frequency generation around 300 GHz.
机译:本文总结了集成硅技术中用于产生高于fmax的振荡器信号的设计技术。它描述了在振荡器中使用N推技术的一般原理图及其理论工作原理。此外,讨论了次谐波注入锁定作为低相位噪声的解决方案。最后,给出了CMOS和BiCMOS制成电路的一些示例作为概念验证,证明了在300 GHz附近产生低相位噪声频率的可行性。

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