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Modeling of trench structures in integrated circuits for fast isolation effectiveness assessment

机译:集成电路中沟槽结构的建模,用于快速隔离有效性评估

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摘要

In this paper, an analytical modeling methodology is proposed for trench structures in integrated circuit substrates. It is based on a modal characterization of the different doping profiles, dealing with trenches as discontinuities transverse to the direction of propagation. Finally, a method for fast isolation effectiveness assessment of a trench integrated in different substrate types is proposed, that includes the effects of mode interaction.
机译:在本文中,提出了一种用于集成电路基板中沟槽结构的分析建模方法。它基于不同掺杂轮廓的模态表征,将沟槽视为横向于传播方向的不连续性。最后,提出了一种对集成在不同衬底类型中的沟槽进行快速隔离有效性评估的方法,该方法包括模式相互作用的影响。

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