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Improved radiation detectors on 4H-SiC epilayers by edge termination

机译:通过边缘终止改进了4H-SiC外延层上的辐射探测器

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We report the development of an edge termination by depositing thin Si_3N_4 passivating film on 4H-SiC epilayer based radiation detector. The edge termination method is shown to be very effective for improving both the detector leakage current and radiation detection performance compared with that of a conventional detector fabricated from the same parent wafer. The detector leakage current was found to have improved two orders of magnitude. Significant improvement in radiation detection performance was shown from alpha spectroscopy measurements prior and subsequent to Si_3N_4 edge termination. Deep Level Transient Spectroscopy (DLTS) measurements revealed a reduction in life-time killing defects of detectors with Si_3N_4 edge termination which could be related to the observed improvements in radiation detection performance.
机译:我们通过在基于4H-SiC外延层的辐射探测器上沉积Si_3N_4钝化薄膜来报告边缘终止的发展。与由相同母晶片制造的常规检测器相比,边缘终止方法显示出对改善检测器泄漏电流和辐射检测性能非常有效。发现检测器泄漏电流改善了两个数量级。 Si_3N_4边缘终止之前和之后的α光谱测量表明,辐射检测性能得到了显着改善。深层瞬态光谱法(DLTS)测量表明,具有Si_3N_4边缘终端的探测器在使用寿命上的致命缺陷减少了,这可能与所观察到的辐射探测性能的提高有关。

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