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Increasing velocity of wafer level reliability characterization: Novel approaches and limitations

机译:晶圆级可靠性表征的提高速度:新方法和局限性

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摘要

Tremendous amounts of wafer level reliability testing is required to support transistor technology development efforts. Conventional testing takes considerable time which severely limits reliability organizations. We present two approaches that help increase data velocity for wafer level reliability measurements and discuss their current limitations.
机译:为了支持晶体管技术的开发工作,需要进行大量的晶圆级可靠性测试。常规测试需要花费大量时间,这严重限制了可靠性组织。我们提出了两种有助于提高晶片级可靠性测量数据速度的方法,并讨论了它们当前的局限性。

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