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Phase-Transition-FET exhibiting steep switching slope of 8mV/decade and 36 enhanced ON current

机译:相变FET的开关斜率为8mV /十倍,导通电流提高了36%

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Vanadium dioxide (VO2), which exhibits electrically induced abrupt insulator-to-metal phase transition (IMT), is monolithically integrated with Silicon MOSFET to demonstrate a steep-slope (sub-kT/q) Phase-Transition FET (Phase-FET). The Phase-FET exhibits switching-slope (SS) of 8mV/decade leading to 36% increase in ON current (ION) over baseline MOSFET. We analyze the electrical characteristics of several threshold-switching materials with enhanced resistivity ratios (>105) beyond VO2 and harness them to enhance the performance of 14nm node FinFETs. Our analysis shows that up to 2.9× increase in ION, and 1.86× reduction in energy at (iso-delay) for an 11 stage ring oscillator (RO) is achievable with Phase FETs using Cu-doped HfO2 threshold switches.
机译:具有电感应的绝缘体到金属的突然相变(IMT)的二氧化钒(VO2)与硅MOSFET单片集成以展示陡峭(sub-kT / q)的相变FET(Phase-FET) 。相FET的开关斜率(SS)为8mV /十倍,导通电流(ION)较基线MOSFET高36%。我们分析了几种阈值开关材料的电学特性,这些材料具有比VO2高的电阻率比(> 105),并利用它们来增强14nm节点FinFET的性能。我们的分析表明,对于11级环形振荡器(RO),使用Cu掺杂HfO2阈值开关的相位FET可以实现ION最多增加2.9倍,(等延迟)能量降低1.86倍。

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