首页> 外文会议>China Semiconductor Technology International Conference >Development of a radiation-hardened standard cell library for 65nm CMOS technology
【24h】

Development of a radiation-hardened standard cell library for 65nm CMOS technology

机译:开发用于65nm CMOS技术的辐射硬化标准单元库

获取原文

摘要

We have developed a radiation-hardened standard cell library for space applications based on the commercial 65nm CMOS technology process. The standard cells are designed using some radiation-hardened (RH) techniques, and the effects of these RH approaches have been validated. Also this 65nm CMOS RH standard cell library has been characterized to support the verilog to GDSII design flow, and the designed radiation tolerant features of this library are: TID > 500 Krad(Si), SEL > 100 MeV cm2/mg, SEU > 37 MeV cm2/mg.
机译:我们基于商业65nm CMOS技术工艺开发了用于空间应用的辐射硬化标准单元库。使用一些辐射硬化(RH)技术设计标准单元,并且已经验证了这些RH方法的效果。同样,该65nm CMOS RH标准单元库具有支持GDSII设计流程的Verilog的特性,并且该库的设计耐辐射特性是:TID> 500 Krad(Si),SEL> 100 MeV cm2 / mg,SEU> 37 MeV cm2 / mg。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号